Übersicht			Auf mobile öffnen

Lieferstatus:	Auf Bestellung (Lieferzeit unbekannt)
Veröffentlichung:	April 2018
Genre:	Naturwissensch., Medizin, Technik
	B / Chemistry and Materials Science / Circuits and Systems / Electronic circuits / Electronic Circuits and Systems / Electronic devices & materials / Electronic materials / Electronics# circuits & components / Elektronische Geräte und Materialien / Microsystems and MEMS / Nanophysics / Nanoscale science / Nanoscale Science and Technology / Nanoscience / Nanostructures / Nanotechnology / Nanotechnology and Microengineering / Nanowissenschaften / Optical and Electronic Materials / Optical Materials / Other manufacturing technologies / Semiconductors mehr...
ISBN:	9783319762937
EAN-Code:	9783319762937
Verlag:	Springer EN
Einband:	Gebunden
Sprache:	English
Serie:	NanoScience and Technology
Dimensionen:	H 235 mm / B 155 mm / D
Gewicht:	3554 gr
Seiten:	138
Illustration:	XIV, 138 p. 92 illus., 54 illus. in color., schwarz-weiss Illustrationen, farbige Illustrationen
Zus. Info:	EUDR exemption - product or manufacturing materials placed on the market prior to 31.12.2025.
Bewertung:	Titel bewerten / Meinung schreiben

Inhalt:

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.