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Autor(en): 
  • Jeroen A. Croon
  • Herman E. Maes
  • Willy M Sansen
  • Matching Properties of Deep Sub-Micron MOS Transistors 
     

    (Buch)
    Dieser Artikel gilt, aufgrund seiner Grösse, beim Versand als 3 Artikel!


    Übersicht

    Auf mobile öffnen
     
    Lieferstatus:   Auf Bestellung (Lieferzeit unbekannt)
    Veröffentlichung:  März 2005  
    Genre:  Naturwissensch., Medizin, Technik 
     
    C / Circuits and Systems / Electrical and Electronic Engineering / Electrical Engineering / Electronic circuits / Electronic Circuits and Systems / Electronics / Electronics and Microelectronics, Instrumentation
    ISBN:  9780387243146 
    EAN-Code: 
    9780387243146 
    Verlag:  Springer EN 
    Einband:  Gebunden  
    Sprache:  English  
    Serie:  #851 - The Springer International Series in Engineering and Computer Science  
    Dimensionen:  H 232 mm / B 156 mm / D  
    Gewicht:  1080 gr 
    Seiten:  206 
    Illustration:  XII, 206 p. 
    Zus. Info:  EUDR exemption - product or manufacturing materials placed on the market prior to 31.12.2025. 
    Bewertung: Titel bewerten / Meinung schreiben
    Inhalt:
    Matching Properties of Deep Sub-Micron MOS Transistors examines this interesting phenomenon. Microscopic fluctuations cause stochastic parameter fluctuations that affect the accuracy of the MOSFET. For analog circuits this determines the trade-off between speed, power, accuracy and yield. Furthermore, due to the down-scaling of device dimensions, transistor mismatch has an increasing impact on digital circuits. The matching properties of MOSFETs are studied at several levels of abstraction:

    A simple and physics-based model is presented that accurately describes the mismatch in the drain current. The model is illustrated by dimensioning the unit current cell of a current-steering D/A converter.

    The most commonly used methods to extract the matching properties of a technology are bench-marked with respect to model accuracy, measurement accuracy and speed, and physical contents of the extracted parameters.

    The physical origins of microscopic fluctuations and how they affect MOSFET operation are investigated. This leads to a refinement of the generally applied 1/area law. In addition, the analysis of simple transistor models highlights the physical mechanisms that dominate the fluctuations in the drain current and transconductance.

    The impact of process parameters on the matching properties is discussed.

    The impact of gate line-edge roughness is investigated, which is considered to be one of the roadblocks to the further down-scaling of the MOS transistor.

    Matching Properties of Deep Sub-Micron MOS Transistors is aimed at device physicists, characterization engineers, technology designers, circuit designers, or anybody else interested in the stochastic properties of the MOSFET.

      



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