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Impact of Ion Implantation on Quantum Dot Heterostructures and Devices
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(Buch) |
Dieser Artikel gilt, aufgrund seiner Grösse, beim Versand als 3 Artikel!
Lieferstatus: |
Auf Bestellung (Lieferzeit unbekannt) |
Veröffentlichung: |
Juni 2017
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Genre: |
Naturwissensch., Medizin, Technik |
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Applied optics /
B /
Chemistry and Materials Science /
Circuits and Systems /
Digital and Analog Signal Processing /
Electronic circuits /
Electronic Circuits and Devices /
Electronic Circuits and Systems /
Electronic devices & materials /
Electronic materials /
Electronics# circuits & components /
Image processing /
Imaging systems & technology /
Laser /
Lasers /
Optical and Electronic Materials /
Optical Materials /
Optical physics /
Optics, Lasers, Photonics, Optical Devices /
Photonics /
Signal Processing /
Signal, Image and Speech Processing /
Speech processing systems |
ISBN: |
9789811043338 |
EAN-Code:
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9789811043338 |
Verlag: |
Springer Nature EN |
Einband: |
Gebunden |
Sprache: |
English
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Dimensionen: |
H 235 mm / B 155 mm / D |
Gewicht: |
315 gr |
Seiten: |
64 |
Illustration: |
XXIII, 64 p. 53 illus., 32 illus. in color., schwarz-weiss Illustrationen, farbige Illustrationen |
Bewertung: |
Titel bewerten / Meinung schreiben
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Inhalt: |
This book looks at the effects of ion implantation as an effective post-growth technique to improve the material properties, and ultimately, the device performance of In(Ga)As/GaAs quantum dot (QD) heterostructures. Over the past two decades, In(Ga)As/GaAs-based QD heterostructures have marked their superiority, particularly for application in lasers and photodetectors. Several in-situ and ex-situ techniques that improve material quality and device performance have already been reported. These techniques are necessary to maintain dot density and dot size uniformity in QD heterostructures and also to improve the material quality of heterostructures by removing defects from the system. While rapid thermal annealing, pulsed laser annealing and the hydrogen passivation technique have been popular as post-growth methods, ion implantation had not been explored largely as a post-growth method for improving the material properties of In(Ga)As/GaAs QD heterostructures. This work attempts to remedy this gap in the literature. The work also looks at introduction of a capping layer of quaternary alloy InAlGaAs over these In(Ga)As/GaAs QDs to achieve better QD characteristics. The contents of this volume will prove useful to researchers and professionals involved in the study of QDs and QD-based devices. |
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