SFr. 147.00
€ 158.76
BTC 0.0028
LTC 2.208
ETH 0.0543


bestellen

Artikel-Nr. 21531787


Diesen Artikel in meine
Wunschliste
Diesen Artikel
weiterempfehlen
Diesen Preis
beobachten

Weitersagen:



Autor(en): 
  • Subhananda Chakrabarti
  • Arjun Mandal
  • Impact of Ion Implantation on Quantum Dot Heterostructures and Devices 
     

    (Buch)
    Dieser Artikel gilt, aufgrund seiner Grösse, beim Versand als 3 Artikel!


    Übersicht

    Auf mobile öffnen
     
    Lieferstatus:   Auf Bestellung (Lieferzeit unbekannt)
    Veröffentlichung:  Juni 2017  
    Genre:  Naturwissensch., Medizin, Technik 
     
    Applied optics / B / Chemistry and Materials Science / Circuits and Systems / Digital and Analog Signal Processing / Electronic circuits / Electronic Circuits and Devices / Electronic Circuits and Systems / Electronic devices & materials / Electronic materials / Electronics# circuits & components / Image processing / Imaging systems & technology / Laser / Lasers / Optical and Electronic Materials / Optical Materials / Optical physics / Optics, Lasers, Photonics, Optical Devices / Photonics / Signal Processing / Signal, Image and Speech Processing / Speech processing systems
    ISBN:  9789811043338 
    EAN-Code: 
    9789811043338 
    Verlag:  Springer Nature EN 
    Einband:  Gebunden  
    Sprache:  English  
    Dimensionen:  H 235 mm / B 155 mm / D  
    Gewicht:  315 gr 
    Seiten:  64 
    Illustration:  XXIII, 64 p. 53 illus., 32 illus. in color., schwarz-weiss Illustrationen, farbige Illustrationen 
    Bewertung: Titel bewerten / Meinung schreiben
    Inhalt:
    This book looks at the effects of ion implantation as an effective post-growth technique to improve the material properties, and ultimately, the device performance of In(Ga)As/GaAs quantum dot (QD) heterostructures. Over the past two decades, In(Ga)As/GaAs-based QD heterostructures have marked their superiority, particularly for application in lasers and photodetectors. Several in-situ and ex-situ techniques that improve material quality and device performance have already been reported. These techniques are necessary to maintain dot density and dot size uniformity in QD heterostructures and also to improve the material quality of heterostructures by removing defects from the system. While rapid thermal annealing, pulsed laser annealing and the hydrogen passivation technique have been popular as post-growth methods, ion implantation had not been explored largely as a post-growth method for improving the material properties of In(Ga)As/GaAs QD heterostructures. This work attempts to remedy this gap in the literature. The work also looks at introduction of a capping layer of quaternary alloy InAlGaAs over these In(Ga)As/GaAs QDs to achieve better QD characteristics. The contents of this volume will prove useful to researchers and professionals involved in the study of QDs and QD-based devices.

      



    Wird aktuell angeschaut...
     

    Zurück zur letzten Ansicht


    AGB | Datenschutzerklärung | Mein Konto | Impressum | Partnerprogramm
    Newsletter | 1Advd.ch RSS News-Feed Newsfeed | 1Advd.ch Facebook-Page Facebook | 1Advd.ch Twitter-Page Twitter
    Forbidden Planet AG © 1999-2024
    Alle Angaben ohne Gewähr
     
    SUCHEN

     
     Kategorien
    Im Sortiment stöbern
    Genres
    Hörbücher
    Aktionen
     Infos
    Mein Konto
    Warenkorb
    Meine Wunschliste
     Kundenservice
    Recherchedienst
    Fragen / AGB / Kontakt
    Partnerprogramm
    Impressum
    © by Forbidden Planet AG 1999-2024
    Jetzt auch mit LiteCoin bestellen!