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Chemical Vapor Deposition: Thermal and Plasma Deposition of Electronic Materials
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Dieser Artikel gilt, aufgrund seiner Grösse, beim Versand als 2 Artikel!
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| This timely reference provides an integrated, ultidisciplinary approach to CVD on a relatively fundamental level, enabling researchers with a basic background in any engineering field to readily understand and apply CVD techniques. At the same time, it becomes the first work to address CVD from the perspective of the properties of thin films and show how to achieve these properties by understanding and modifying deposition conditions. |
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i.d.R. innert 7-14 Tagen versandfertig
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